Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials.

iX-factory can deposit:

• PECVD silicon-oxynitrides (refractive index, stress tuning)
• LPCVD silicon-rich-nitride
• LPCVD silicon-nitride
• LPCVD polysilicon
• Thermal oxidation (wet and dry)
• TEOS silicon oxide

LPCVD Silicon-rich-nitride

LPCVD silicon rich nitride is a very versatile LOW STRESS material

Applications:

• Mask for KOH and DRIE etching
• Membranes (10 nm ... 1 µm)
• Chemical passivation
• Electrical and thermal isolation
• Mechanical protection
• Ultra high contrast waveguides

Examples:

Will follow!